SWISSNPT: FROM THE SWISS LIGHT SOURCE TO THE FACTORY FLOOR
With Paul Scherrer Institute (PSI) as its technology partner, SwissNPT is advancing an established compact - synchrotron design for semiconductor inspection, with a 13.5 nm EUV focus and a next-phase BEUV roadmap.
«Switzerland Innovation Park Innovaare brings photon science, engineering and industrial connections together. For SwissNPT, it is the place to turn an established technical foundation into a platform shaped by customer needs.»
Founder & CEO, SwissNPT AG
As chips become smaller and more three-dimensional, defects become harder to find and more costly to miss. For the 2 nm generation and beyond, complex device structures, advanced packaging and High-NA extreme-ultraviolet (EUV) lithography raise the demands on metrology and inspection. SwissNPT is developing compact synchrotron light sources to bring dedicated photon capability closer to semiconductor manufacturing. The objective is direct: help detect a mask defect before it is replicated across many wafers.
Drawing on more than 17 years in semiconductor equipment and deep-tech commercialization, Tariq Ghous founded SwissNPT AG at Switzerland Innovation Park Innovaare in Villigen. The company is commercializing licensed compact-source technology from the Paul Scherrer Institute (PSI), its technology partner. A completed feasibility study, and an established Conceptual Design, provides a validated technical starting point, drawing on accelerator and photon-science expertise from the Swiss Light Source (SLS) and SwissFEL. SwissNPT is building on a defined foundation, not starting from scratch.
The initial 13.5 nm EUV design targets high photon flux, brilliance and coherence for actinic mask inspection at the lithography wavelength and imaging methods such as ptychography. Top-up injection supports stable beam current, while multi-port access and wavelength flexibility create scope for complementary measurement workflows. Performance is specific to each port and beamline. SwissNPT’s semiconductor roadmap also extends to beyond-EUV (BEUV), including research wavelengths around 6.7 nm, to support the development of shorter-wavelength mask materials, optics and inspection methods. Photon performance and each application require validation.
SwissNPT is engaging industrialization partners from the global semiconductor equipment supply chain and holding technical discussions with leading metrology and inspection companies. The planned next phase would refine the source concept and develop a full technical design with PSI and industrial partners, guided by a launch or co-development customer. The aim is a manufacturable, reliable and serviceable system built around measurable customer requirements. Investment would support detailed engineering and subsystem validation toward the first integrated system.
Adapted soft-X-ray configurations could later support life sciences and nanoscale material characterization, including cellular imaging and battery-material analysis. Separately engineered higher-energy configurations offer further potential for selected aerospace, precision-manufacturing and pharmaceutical applications. Each requires dedicated validation. Semiconductors remain the first commercial priority: a customer-defined EUV platform with a BEUV development path. Through Park Innovaare and Switzerland Innovation, SwissNPT aims to anchor industrial photon infrastructure in Switzerland, strengthen Europe’s semiconductor value chain and serve customers globally.
SwissNPT at a glance
- 13.5 nm EUV + BEUV roadmap - Semiconductor-first development - Optimized initial EUV design, with a next-phase BEUV direction around 6.7 nm; application performance requires validation.
- Established design foundation - Defined concept. Documented feasibility - SwissNPT builds on a defined compact-synchrotron concept supported by a completed conceptual design and feasibility study together with PSI as its technology partner.
- Stable, flexible photon delivery - Top-up and multi-port architecture - Beam replenishment supports stable current; complementary outputs enable wavelength flexibility. Performance is port-specific.
- Customer-defined engineering - From concept to industrial design - Planned co-development around photon delivery, integration, reliability, serviceability and operating economics.
Shape the first industrial platform
SwissNPT welcomes discussions with semiconductor manufacturers, metrology equipment companies, deep-tech investors, and engineers or scientists interested in shaping its first industrial platform.
swissnpt.com
contact: tariq.ghous@swissnpt.com
picture below: SwissNPT’s compact-synchrotron concept and application roadmap: 13.5 nm EUV first, a next-phase BEUV direction, and separately developed adjacent applications. Concept visualization, not a completed system.
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